Recent progress in understanding the electrochemical behavior of the oxidized boron-doped diamond electrode surface

Boron-doped diamond (BDD) thin films have recently come to be considered as being among the most ideal electrode materials for electroanalysis and electrolysis. For BDD films prepared by use of the microwave plasma-assisted chemical vapor deposition (MPCVD) method, the as-deposited surfaces are hydrogen-terminated. These surfaces, however, can be oxidized while being used as anodes, i.e., at relatively high potentials, and in the process, the physical and electrochemical properties can be modified.